Folgen
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Episode 31 features German ALD professor, Dr. Martin Knaut. Martin is the chair for the Institute of Semiconductor and Microsystems Technology at TU Dresden and the atomic layer processing group leader. He is also a founding member of the Atomic Layer Process Innovation Network, or ALPIN, organizer of the annual ALD for Industry event, and runs a small in situ tool development company, called ALS Metrology. With a long career working with ALD in Dresden, at the likes of Infineon and Qimonda, Martin has witnessed the ebbs and flows of the semiconductor industry in the state of Saxony.
Martin and Tyler discuss the goal of the Silicon Saxony organization, how we can better recruit students in microelectronics, and why he originally started the Atomic Layer Process Innovation Network. They also discuss his company, ALS Metrology, the importance of using in situ monitoring for process development, and his work on flash-enhanced ALD.
In this episode:
00:00 Intro
01:48 Martin’s background & semiconductors in Dresden
10:00 Recruiting issues for microelectronics
17:29 ALPIN & ALD for Industry events
29:34 ALS Metrology
34:57 Importance of in situ monitoring
41:59 Flash-Enhanced ALD
53:55 Concluding remarks
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In this episode, Tyler is joined by Professor Carl Hägglund from Uppsala University. They discuss Carl’s motivations for pursuing ultrathin solar cells, how he learned ALD at Stanford in Stacey Bent’s lab, and an unlikely research connection through his child’s school. They also talk about why ALD is useful for plasmonic solar cells, optimization of SnS ALD and his planned path towards a fully realized ultrathin photovoltaic.
00:00 Introduction
01:45 Motivation for fabricating plasmonic solar cells
09:58 Learning ALD at Stanford
22:46 Optimizing SnS ALD process
30:33 Path towards an ultrathin solar cell
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Fehlende Folgen?
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Dr. Suvi Haukka, former executive technologist at ASM, ASM Fellow and ALD Innovator Awardee, joins Tyler for Episode 29. Suvi began her ALD career at Microchemistry in Finland working on atomic layer epitaxy on catalysts for under the direction of ALD technology inventor, Tuomo Suntola. She continued with Microchemistry as head of the thin film development group before spending most of her time teaching the world’s biggest semiconductor companies, like Intel and Samsung, about ALD. Suvi is one of the integral people in introducing ALD to the semiconductor industry in the 2000s.
Suvi and Tyler discuss how she started working with ALD, what it was like to do a PhD with Tuomo Suntola, and how the make up of Microchemistry changed over the years. We also discuss the circumstances surrounding the ASM acquisition, how development changed under new leadership, and how it felt pitching ALD to the semiconductor industry.
In this episode:
00:32 Introduction to Microchemistry
06:01 Doing a PhD with Tuomo Suntola
19:00 Visiting semiconductor companies
25:37 Post-ASM acquisition
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In Episode 28 of ALD Stories, Tyler is joined by Aalto University’s Hele Savin. Hele is a professor in the department of Electronics and Nanoengineering where she uses ALD to engineer photovoltaics and semiconductor devices. In 2017, Hele was awarded the women’s innovation prize from the Finnish parliament after fabricating a black silicon solar cell with a record-breaking 22.1% efficiency and currently uses ALD to create induced junction photodiodes with over 100% external quantum efficiency.
Hele and Tyler discuss how she was first exposed to ALD by Beneq, a mindset that using ALD was dirty, and how mind-blowing early ALD passivation results were. We also talk about why ALD oxides are better than thermal SiO2, the theoretical implications of breaking 100% EQE, and upcoming work in up conversion in her lab.
In this episode:
00:00 Intro
07:45 First experience with ALD
16:37 Passivation of Black Si Solar cells
29:52 ALD for Induced Junction Diodes
39:06 Theoretical Implications of High EQE
47:35 Future Up Conversion work
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For Ep. 27, Dr. Rob Clark from Tokyo Electron joins to discuss his rise from an equipment know-nothing to ALD process engineer extraordinaire. Rob, the self-proclaimed Manipulator of Matter, is a Senior MTS and Technology Director at TEL where he leads process and integration of thin film deposition methods for next-generation semiconductor devices.
Recorded live at ALD ALE 2023 in Washington, Rob and Tyler discuss how he first learned ALD on CVD equipment, the early days of high-k ALD process development, and his work in making some of the first hafnium precursors for ALD integration in semicon at Schumacher. They also talk about his time as the only engineer at NanoFab North in Albany, how incredibly advanced semiconductor technology has become, and what the next decade of ALD research might look like.
In this episode:
00:00 Introduction
01:58 Post-grad at Schumacher
13:23 Learning the ALD ropes
19:16 Early HfO2 process development
23:40 Albany, NY Semi ecosystem
32:32 ALD process development insights
42:24 How cool are semiconductors?!’
49:44 Rob’s ALD Outlook
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In Episode 26, Professor Stacey Bent from Stanford University joins to discuss all aspects of her career, including early area selective deposition work, how her different academic appointments in chemistry and engineering have influenced the direction of her work, and how ALD can be used in energy applications. Stacey and Tyler also chat about how Stacey finds the best paths for her students, how being a professor and Vice Provost feedback to each other, and new programs she has initiated in her Vice Provost position.
In this episode:
00:00 Introduction
03:45 Area Selective Work
15:40 Chemistry & Engineering Backgrounds
21:20 ALD for energy applications
33:54 Stacey as an advisor
36:19 Vice Provost position
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In its short 50 years of existence, the history of ALD has been of great interest, being heavily researched and documented in the last decade. One can follow the story from many lenses: one in particular is to view the technology’s development is through an equipment perspective. Each milestone in process technology was accompanied and enabled by new ALD tools. Without innovative equipment design, we would not have the vast ALD ecosystem we do today. Via patents and literature, this ALDeep Dive will journey the evolution of the ALD reactor. It starts from Tuomo Suntola’s original reactor and IP, moves through the early days of commercial reactors, explore the introduction of plasma, powder and spatial tools, and wrap up with today’s equipment landscape and thoughts on the personal aspect of ALD reactors.
In this episode:
00:00 - Intro
01:33 – Suntola’s 1st Reactor
03:15 – Suntola’s Patented Configurations
07:38 – The First Commercial Reactor
10:50 – Plasma, Please
15:20 – Powder ALD Reactors
20:37 – Reintroduction of Spatial ALD
24:10 – Today’s ALD Tool Landscape
25:43 – Concluding Thoughts
Important Papers & Patents
Chem. Vap. Dep. 2014, 20, 10-11-12, 332-344
T. Suntola, J. Antson, International patent, FIN 52359, US 4 058 430, priority Nov 29, 1974, publication Nov 15, 1977.
T. Suntola, A. Pakkala, S. Lindfors, International patent, FIN 57975, US 4 413 022, priority Feb 28, 1979, publication Nov 1, 1983.
J. Vac. Sci. Technol. A, Vol.29, No.5, Sep/Oct 2011
J. Vac. Sci. Technol. A 25 (5) Sep/Oct 2007
Applied Physics Letters 92, 192101 (2008)
Journal of Vacuum Science & Technology A 30, 021502 (2012)
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Dr. Fred Roozeboom joins ALD Stories for Ep. 24. Fred spent most of his career in the semiconductor industry at Philips and NXP working on rapid thermal processing and passive integration. He pivoted to ALD at the TNO Holste Centre and now finds himself at his alma mater, University of Twente. Fred was recently awarded the Gordon E. Moore Medal for Outstanding Achievement in Solid State Science and Technology from the ElectroChemical Society. Fred and Tyler talk about the semiconductor industry in the 80’s, his original RTP work at Phillips, and the importance of passive integration. They also discuss the Medtronic pacemaker, his world record during the great reintroduction of spatial ALD and the applications he’s most excited to see come to life with atomic layer deposition.
In this episode:
00:00 Introduction
01:43 Semiconductor Industry in the 80’s
07:59 Rapid Thermal Processing & Creation of NXP
19:32 Passive Integration & 3D Silicon
33:41 Pivot to ALD
46:48 Fred’s ALD Outlook
#ALDep #semiconductors #nanotechnology
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In Episode 23 of ALD Stories, Dr. Harm Knoops joins Tyler to discuss his dual role at Eindhoven University and Oxford Instruments Plasma Technologies. As an Atomic Scale Specialist, Harm routinely advises on processes in ALD, ALE and 2D materials while informing their work with supplemental research at Eindhoven. Harm and Tyler talk about alternatives careers to the traditional industry and academia binary, how scientists can leverage their technical knowledge, and how working in a cross-institute position makes for efficient science. We also touch on Harm’s work with plasmas, tackle misconceptions about plasma conformality, and how Harm approaches learning new topics.
In this episode:
00:00 Intro
01:20 Working in both industry & academia
11:45 Careers leveraging technical backgrounds
24:20 Misconceptions about plasma conformality
43:20 How to learn new fields quickly
#ALDep #ALEtch #nanotechnology
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Professor Sean Barry from Carleton University joins Tyler on Episode 22 of ALD Stories. Sean recalls his time working at the University of Helsinki and a mishap or two in Mikko Ritala’s lab, how the Finnish ethos inspires him, and why he considers Helsinki his second city. Sean also talks about how knowledge of fundamental chemistry is important for understanding atomic layer deposition, why he decided to write a book on the topic, and how chemistry informed the evolution of gold ALD.
In this episode:
00:00 Intro
01:22 Living in Helsinki
09:30 Sean’s background and Harvard ALD
21:00 Evolution of Au ALD
32:05 Sean’s book
45:17 What material is Sean’s dream?
50:23 Sean’s sage wisdom
#ALDep #nanotechnology #chemistry #ALDStories
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In Episode 21, John Hennessy from NASA’s Jet Propulsion Lab joins ALD Stories to talk about his work using ALD to deposit UV coatings for astronomical imaging applications. John talks about the relationship between NASA and JPL, how UV coatings allow us to see more of the universe, and how the technology has improved since the Hubble Space Telescope. John and Tyler also discuss how to test the readiness of devices for eventual launch and NASA’s Decadal Survey for deciding new mission concepts.
In this episode:
00:00 Intro
01:48 John’s Background
09:49 NASA/JPL Relationship
14:05 UV Coatings, Detectors and Telescopes
31:51 Testing coatings for launch
40:30 NASA Decadal Survey
46:49 Outlook and Outro
#ALDep #ALDStories #optics #space #nanotechnology
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In Episode 20, Jonas Sundqvist, ALD researcher, entrepreneur and consultant joins Tyler for his 3rd time on the show to talk about his company, AlixLabs (Eps. 4 & 7). AlixLabs has developed a cutting-edge technology called Atomic Pitch Splitting (APS) which utilizes a topographically-selective atomic layer etching process. Jonas discusses how APS works, why they could potentially pattern substrates without the use of multiple lithography steps, and how AlixLabs can offer semiconductor manufacturers with a simpler, more cost-effective and more precise method of creating features with nanometer spacings.
In this episode:
00:00 Introduction
02:55 AlixLabs and APS Background
08:30 Topographical Selectivity
13:30 APS vs Traditional Patterning
24:30 Cost and Implementation
33:05 AlixLabs Outlook
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Tyler is joined by Dr. Jeffrey Elam from Argonne National Lab in Chicago. Jeff is the head of the Atomic Layer Deposition research program at Argonne and has received numerous awards, accolades and patents for his work, the ALD Innovator Award and Lifetime Achievement Award at Argonne as examples. In this episode, Tyler and Jeff discuss his time as a post doc in the Steven George lab where he built the first ALD reactors, how he began the ALD group at Argonne, and some of his award-winning work on fabricating large-area microchannel plates.
02:10 Early ALD in the George Group
14:55 Bringing ALD to Argonne
29:44 Microchannel Plates
44:51 Outlook & Final Remarks
#ALDep #nanotechnology
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In Episode 18, Professor Parag Banerjee from the University of Central Florida joins Tyler to chat about his less-than-traditional path in ALD. Parag was a Process Engineer at Micron during the time ALD was first being implemented into their manufacturing workflows. Parag tells Tyler about his role at Micron, how Micron handled the addition of ALD, his decision to return to academia and what’s happening at his lab in Florida.
In this episode:
00:00 Introduction
01:49 Time at Micron
21:30 Journey back to academia
36:46 Banerjee Lab @UCF
Follow Parag and his work at www.paragbanerjee.wixsite.com/website and www.prem.cecs.ucf.edu
#ALDep #semiconductors
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In Episode 17, Tyler speaks with Matthias Young from the University of Missouri, aka Mizzou. Matthias talks about this use of oxidative MLD for depositing redox active polymer films which paves the way for more cost-effective electrode materials. Matthias and Tyler discuss his journey to, from and back to ALD, how working in other fields can benefit your creativity, results from his recent work in oMLD paper, and how ALD can be used as a tool for understanding fundamental questions about tricky surface phenomena.
In this episode:
00:00 Introduction
02:46 Matthias’ Journey Away from ALD
08:25 ALD Community
17:40 Tech Talk: Redox Active Polymers
35:38 Applications: Capacitive Deionization & Solid State Batteries
43:30 Advice, Reflection and Outro
Follow Matthias at thinfilmgroup.missouri.edu and on Twitter @MatthiasJYoung
#ALDep #MLDep #energy
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Episode 16 features Dr. Maksym Plakhotnyuk, the CEO and Founder of Atlant 3D Nanosystems. Atlant 3D produces the world's first reactor for direct writing of ALD - the ultimate area-selective ALD process. Their Nanofabricator tool will could be the enabling technology for on-demand printing of microelectronics. In this episode, Maksym tells Tyler about the company's origins, their deal with NASA to create a 0G ALD reactor and Maksym's own history as an entrepreneuer.
In this episode:
00:00 - Introduction
01:53 - Maksym's Background & Atlant 3D Roots
19:03 - Atlant 3D Name Origins
22:00 - Atlant 3D Microreactor
36:28 - NASA Deal and 0G Reactor
Follow Maksym and Atlant 3D on Twitter: @MPlakhotnyuk & @Atlant3d
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Back for her second episode, Professor Riikka Puurunen is bringing us back to the basics with a deep dive on conformality. Recorded live from the Harald Herlin Learning Center at Aalto University, Tyler and Riikka talk about the all-important property of ALD. In this episode, Riikka explains the history of conformality in ALD, her recent paper on modeling collaboration, the origins of the PillarHall conformality test structures and a conversation on open science.
In this episode:
00:00 Intro
03:39 History of conformality
10:21 Has our understanding of conformality changed?
12:25 Is conformality an inherent property?
18:38 Conformality modeling findings
37:28 PillarHall Test Structures
49:35 Open Learning for ALD
Follow Riikka at @rlpuu on Twitter and at www.aalto.fi.
ALD History Blog: http://aldhistory.blogspot.com/
Virtual Project on the History of ALD: https://vph-ald.com/
Open ALD Learning Site (Hosted by Aalto): https://openlearning.aalto.fi/course/view.php?id=100#section-0
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In Episode 13, Tyler chats with Michael Nolan from the Tyndall National Institute in Ireland. Michael specializes in molecular and atomistic modeling, using his expertise to help predict, understand, and screen ALD precursors and chemistries. Mike and Tyler talk about all things modeling, including basics for modeling ALD reactions, limitations of current modeling efforts, and how theorists and experimentalists can powerfully work together. Enjoy!
In this episode:
00:00 Intro
01:48 Michael’s Background & Tyndall National Institute
11:03 Modeling Basics
26:09 Modeling Limitations
31:09 Intersection of Experimentation and Modeling
38:27 Future of ALD Modeling
47:52 Electron Explosions?
52:27 Wrap up & Outro
Follow Mike on Twitter @Mick_geek
Follow Tyler on Twitter @TyMytheALDGuy -
Episode 12 brings Tyler to Colorado where he chats with Arrelaine Dameron, VP of R&D at ForgeNano and an old friend from graduate school. ForgeNano is an ALD equipment supplier specializing in particle ALD for battery, catalysis, and pharmaceutical applications. The two talk about ALD at battery interfaces, love for the ALD community and ForgeNano’s recent activities, including their move to a new facility.
In this episode:
00:00 Introduction & Careers in ALD
05:03 Battery Interface Coatings
27:35 Arrelaine’s Background and ForgeNano Activities
37:40 Ending & Outro
Follow Arrelaine and Forge Nano at www.forgenano.com
Follow Tyler at @TyMytheALDGuy
#ALDep #battery
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